| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern formation method capable of highly accurately arranging a plurality of patterns transferred from a template, and a template.SOLUTION: According to an embodiment, a pattern formation method includes a step of separating a template 20 from a cured imprint resist 11, positioning an alignment mark 35 formed in a non-imprint part 31 of the temperate 20 at a transfer pattern 42 of an alignment pattern 25 without bringing the alignment mark into contact with the imprint resist 11, and bringing a main pattern 23 of the template 20 and the alignment pattern 25 into contact with an uncured imprint resist 11 supplied to a shot region next to the cured imprint resist 11. |
