| 摘要 |
PROBLEM TO BE SOLVED: To easily clean inside a chamber.SOLUTION: A substrate processing apparatus 1 comprises: a substrate holding part 2; a substrate rotation mechanism 5; and a chamber 7. The substrate rotation mechanism 5 comprises: an annular rotor part 52 disposed in an interior space 70 of the chamber 7; and a stator part 51 disposed around the rotor part 52 outside the chamber 7. The substrate holding part 2 is attached to the rotor part 52 in the interior space 70 of the chamber 7. In the substrate processing apparatus 1, second process liquid 320 is stored in the interior space 70 of the chamber 7, so that the substrate holding part 2 in a state not holding the substrate 9 and the entire rotor part 52 are immersed with the second process liquid 320. Then, the substrate holding part 2 is rotated together with the rotor part 52 by the substrate rotation mechanism 5, thereby, the process liquid 320 in the interior space 70 is agitated, and as a result, inside of the chamber 7 can be easily cleaned. |
