| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas barrier film which exhibits very excellent gas barrier performance as a phase difference film substrate and good productivity, and can be applied to an OLED display, provide a method of manufacturing the gas barrier film which exhibits high barrier performance, excellent bending resistance and smoothness, and has cutting suitability, and provide an electronic device using the gas barrier film.SOLUTION: In a method of manufacturing a gas barrier film having a gas barrier layer formed by irradiating with vacuum ultraviolet light after a process of applying and drying a composition containing a solvent, polysilazane, and an amine compound on a surface of a base material 0, the solvent contains 20-50 mass% of a solvent component of which a Hansen SP value distance Ra with the base material 0 is 8-14, and a boiling point is 70-110°C. |
