| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask drawing device which inhibits drift of an electron beam, and to provide a correction method of the electron beam.SOLUTION: A mask drawing device includes: an electronic lens-barrel which radiates an electron beam to a mask substrate; a pipeline which supplies a cooling medium to an object to be cooled disposed in the electronic lens-barrel; temperature adjustment means for adjusting a temperature of the cooling medium; a temperature gauge which is provided most near the object to be cooled and on an outward way of the pipeline; and correction means which corrects a radiation position of the electron beam according to the temperature measured by the temperature gauge. |
