发明名称 MANUFACTURING METHOD FOR NITRIDE SEMICONDUCTOR CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing an excellent nitride crystal while preventing the deposition of a polycrystalline substance in the case where a non-polar surface or a semi-polar surface is a growing principal surface.SOLUTION: In the method, a nitride semiconductor crystal is made to grow on a seed crystal 110, in which a non-polar surface or a semi-polar surface is a principal surface. The seed crystal 110 is attached through an underlay substrate 109 to a susceptor 107. The outer edge of the lower substrate 109 is arranged on the inner side than the outer edges of the seed crystal 110 and the susceptor 107. The distance R between the seed crystal 110 and the susceptor 107 is 1 to 9 mm.
申请公布号 JP2014047097(A) 申请公布日期 2014.03.17
申请号 JP20120190555 申请日期 2012.08.30
申请人 MITSUBISHI CHEMICALS CORP 发明人 OHATA TATSUHIRO;KUBO SHUICHI;ENATSU YUKI
分类号 C30B29/38;C30B25/12;H01L21/205 主分类号 C30B29/38
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