发明名称 SiC SINGLE CRYSTAL MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a SiC single crystal manufacturing method capable of improving a growing rate in a solution method more drastically than the prior art.SOLUTION: A method for manufacturing a SiC single crystal, which is put into a crucible and made to grow by holding a seed crystal substrate in contact with a Si-C solution having a temperature gradient growing down from the inside to a liquid level. The temperature gradient within a range of 10 mm from the liquid level of the Si-C solution is larger than 42°C/cm.
申请公布号 JP2014047096(A) 申请公布日期 2014.03.17
申请号 JP20120190547 申请日期 2012.08.30
申请人 TOYOTA MOTOR CORP;NIPPON STEEL & SUMITOMO METAL 发明人 KAWATARI MIKIHISA;KUSUNOKI KAZUHIKO;KAMEI KAZUTO
分类号 C30B29/36;C30B19/10 主分类号 C30B29/36
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