发明名称 |
SiC SINGLE CRYSTAL MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a SiC single crystal manufacturing method capable of improving a growing rate in a solution method more drastically than the prior art.SOLUTION: A method for manufacturing a SiC single crystal, which is put into a crucible and made to grow by holding a seed crystal substrate in contact with a Si-C solution having a temperature gradient growing down from the inside to a liquid level. The temperature gradient within a range of 10 mm from the liquid level of the Si-C solution is larger than 42°C/cm. |
申请公布号 |
JP2014047096(A) |
申请公布日期 |
2014.03.17 |
申请号 |
JP20120190547 |
申请日期 |
2012.08.30 |
申请人 |
TOYOTA MOTOR CORP;NIPPON STEEL & SUMITOMO METAL |
发明人 |
KAWATARI MIKIHISA;KUSUNOKI KAZUHIKO;KAMEI KAZUTO |
分类号 |
C30B29/36;C30B19/10 |
主分类号 |
C30B29/36 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|