PATTERN INSPECTION DEVICE, PATTERN INSPECTION METHOD, AND METHOD OF MANUFACTURING PATTERN SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To inspect any of patterns mutually different by directions with high sensitivity by using polarized dipole illumination.SOLUTION: A pattern inspection device includes: a half-wave plate 130 which is arranged in a position conjugate to a sample and changes a polarization state of partial illumination light to generate illumination light including first linearly polarized light and second linearly polarized light which are different by polarization direction; a roof prism pair which divides one linearly polarized light in a first direction to generate first and second beams; a roof prism pair which divides the other linearly polarized light in a second direction different from the first direction to generate third and fourth beams; an objective lens 105 which irradiates a first area being a part of a visual field on a pattern substrate, with the first beam and the second beam and irradiates a second area different from the first area within the visual field, with the third beam and fourth beam; a TDI 120a which detects diffracted light due to the first and second beams; and a TDI 120b which detects diffracted light due to the third and fourth beams.