| 摘要 |
PROBLEM TO BE SOLVED: To provide a stripper composition for a photoresist.SOLUTION: The stripper composition for a photoresist comprises: 1 to 5 mass% of a compound expressed by chemical formula (1); 70 to 95 mass% of a polar organic solvent; 0.1 to 5 mass% of a hydroxide-based compound; and the balance water. As the stripper composition particularly does not contain an anticorrosive in the composition but contains an appropriate amount of the compound expressed by chemical formula (1), a stripping process can be efficiently completed in a short time, and thereby, changes in the composition can be minimized in the stripping process that is carried out at a relatively high temperature compared to other processes. As the composition does not contain an anticorrosive, a post-process failure such as vapor deposition failure due to adsorption of a water-insoluble anticorrosive can be prevented as well as damages on an electrode can be prevented. |
