| 摘要 |
PROBLEM TO BE SOLVED: To provide a hot water circulation device that prevents water leakage in makeup water processing to a cistern.SOLUTION: A hot water circulation device 1 includes: a makeup water processing unit 61 that executes makeup water processing for supplying water to a cistern 30 from a makeup water passage 31 when a water level in the cistern 30 becomes lower than a detection level with a low water level electrode 34; an overheat prevention unit 63 that prohibits the actuation of a burner 22 when an overheat switch 25 is actuated or when a temperature fuse 26 is fused; and a water leakage prevention unit 62 that prohibits the makeup water processing or limits a water supply amount to the cistern 30 from the makeup water passage 31 in the makeup water processing to a predetermined flow rate or less when the overheat switch 25 is actuated or when the temperature fuse 26 is fused. |
