发明名称 GATE VALVE AND SUBSTRATE PROCESSING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a gate valve for which it is hardly required to increase a space in a height direction, and in which cleaning of a valve element can also be performed.SOLUTION: A gate valve 70 comprises: a housing 71 including a vertical wall on which a plurality of openings 71a corresponding to substrates to be conveyed are formed; a valve element 81 provided within the housing 71 for opening/closing the openings 71a; a valve element lifting mechanism 73 for lifting the valve element; a valve element rotating mechanism 75 for rotating the valve element with lifting by the valve element lifting mechanism 73; and a valve element pressing mechanism 74 for pressing a seal surface of the valve element against the openings. The valve element lifting mechanism 73 lifts the valve element 81 between an opening corresponding position and a retracting position, the valve rotating mechanism 75 rotates the valve element 81 while the valve element 81 is lifted by the valve element lifting mechanism 73, and the valve pressing mechanism 74 presses the valve element 81 at the opening corresponding position.
申请公布号 JP2014049532(A) 申请公布日期 2014.03.17
申请号 JP20120189839 申请日期 2012.08.30
申请人 TOKYO ELECTRON LTD 发明人 TATSUSHITA KOICHI
分类号 H01L21/677;B65G49/00;F16K3/06;F16K3/18;F16K31/524;F16K51/02 主分类号 H01L21/677
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