发明名称 PHOTOSENSITIVE COMPOSITION AND LITHOGRAPHIC ORIGINAL PLATE USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a thermal negative type lithographic printing original plate having a photosensitive layer featuring high sensitivity, excellent reproducibility in FM screening, and excellent print durability and chemical resistance at a minute image portion, and provide a photosensitive composition for the photosensitive layer.SOLUTION: A photosensitive composition at least contains an alkali-soluble resin having a monomer unit represented by the formula (I), at least one or more kinds of silane coupling agent, an infrared absorber, a radical-polymerizable initiator, and a polymerizable compound having an ethylenic double bond. In the formula (I), Rand Rrepresent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms which may have a substituent and Land Lrepresent an alkylene group having 1 to 10 carbon atoms which may have a substituent or an aryl group having 6 to 15 carbon atoms which may have a substituent.
申请公布号 JP2014048569(A) 申请公布日期 2014.03.17
申请号 JP20120193155 申请日期 2012.09.03
申请人 OKAMOTO KAGAKU KOGYO KK;SHIN ETSU CHEM CO LTD 发明人 SATO NAOYA;TSUCHIDA KAZUHIRO;HIROKAMI MUNENAO;NAKATSUKA MASAO;KOYA YOSHIHIRO
分类号 G03F7/038;C08F220/12;C08F220/36;G03F7/00;G03F7/075;H01L21/027 主分类号 G03F7/038
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