| 摘要 |
PROBLEM TO BE SOLVED: To more reliably clean members constituting a vapor deposition device.SOLUTION: The plasma vapor deposition device comprises: a chamber 19; a shutter 42; a pair of roller shafts 13, 14 provided in a first space S1, and respectively holding a feeding roller 20 feeding a belt-like film 1 and a take-up roller 21 taking up the film 1 fed from the feeding roller 20; an electrode 17 provided in the first space S1, opposed to the film 1 fed from the feeding roller 20, and making component gas containing a component between the electrode 17 and the film 1 into plasma; a pair of roller pick-up members 30A that move forward and backward in an axial line direction of the pair of roller shafts 13, 14 when the shutter 42 is opened, and that can retreat the feeding roller 20 and the take-up roller 21 held by the pair of roller shafts 13, 14 in a second space S2; a component gas introduction part 26 for introducing the component gas; and a cleaning gas introduction part 26 for introducing cleaning gas. |
