| 摘要 |
<p>A REACTOR (10) IS DISCLOSED FOR PRODUCING POLYCRYSTALLINE SILICON, WHICH REACTOR IS PROVIDED WITH A REACTOR BASE PLATE (2) WHICH HAS A MULTIPLICITY OF NOZZLES (4) FORMED THEREIN. A SILICON-CONTAINING GAS FLOWS THROUGH THE NOZZLES (4). A PLURALITY OF FILAMENT RODS (6) ARE LIKEWISE MOUNTED ON THE REACTOR BASE PLATE (2). IN ADDITION, A GAS OUTLET OPENING (8) FOR FEEDING USED SILICON-CONTAINING GAS TO AN ENRICHMENT AND/OR TREATMENT STAGE IS PROVIDED. THE GAS OUTLET OPENING (8) IS FORMED AT A FREE END (21) OF AN INNER TUBE (20), WHEREIN THE INNER TUBE (20) IS CONDUCTED THROUGH THE REACTOR BASE PLATE (2). (FIGURE 2)</p> |
