发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
A semiconductor device includes a lamination structure of an insulating capping line and a conductive line extended in a first direction on a substrate; contact plugs which have a sidewall facing the conductive line with air spacers therebetween and arranged in a line in the first direction; and a support which has a width varying according to a position in the first direction and formed between the contact plugs and the insulating capping line in order to define the height of the air spacer. |
申请公布号 |
KR20140032219(A) |
申请公布日期 |
2014.03.14 |
申请号 |
KR20120098852 |
申请日期 |
2012.09.06 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HWANG, YOO SANG;CHUNG, HYUN WOO;KIM, DAE IK |
分类号 |
H01L27/108;H01L21/28;H01L21/8242 |
主分类号 |
H01L27/108 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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