| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition that enables production of a resist pattern with excellent line edge roughness.SOLUTION: A resist composition contains a resin including a structural unit having a group represented by formula (xx), and at least one selected from the group consisting of a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2), and an acid generator, where Xrepresents a 2-18C trivalent hydrocarbon group which may have a substituent, Rrepresents a hydrogen atom or a 1-12C hydrocarbon group, Land Lrepresent -O- or *-O-(CH)-CO-O-, and k1 represents an integer of 1-7. |
