发明名称 DRESSING UNIT AND LAPPING APPARATUS OF WAFER INCLUDING THE SAME
摘要 In a dressing unit of dressing the upper and the lower plate of a lapping apparatus, the embodiment includes a body having a cavity; a dressing block which is arranged in the cavity to dress the upper and/or the lower plate; and a fixing unit which is arranged in the body of the cavity.
申请公布号 KR20140031531(A) 申请公布日期 2014.03.13
申请号 KR20120097488 申请日期 2012.09.04
申请人 LG SILTRON INCORPORATED 发明人 KWON, KI SOO
分类号 H01L21/304 主分类号 H01L21/304
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