发明名称 Back Side Defect Reduction for Back Side Illuminated Image Sensor
摘要 Provided is an image sensor device. The image sensor device includes a substrate having a front side and a back side. The image sensor also includes a radiation-detection device that is formed in the substrate. The radiation-detection device is operable to detect a radiation wave that enters the substrate through the back side. The image sensor further includes a recrystallized silicon layer. The recrystallized silicon layer is formed on the back side of the substrate. The recrystallized silicon layer has different photoluminescence intensity than the substrate.
申请公布号 US2014073080(A1) 申请公布日期 2014.03.13
申请号 US201314088596 申请日期 2013.11.25
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 CHUANG CHUN-CHIEH;YAUNG DUN-NIAN;TU YEUR-LUEN;LIU JEN-CHENG;CHOU KENG-YU;WANG CHUNG CHIEN
分类号 H01L27/146 主分类号 H01L27/146
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