| 摘要 |
PROBLEM TO BE SOLVED: To provide an immersion exposure apparatus capable of suppressing generation of a defect in a device pattern transferred to a substrate to be exposed.SOLUTION: According to one embodiment of the present invention, the immersion exposure apparatus is provided. The immersion exposure apparatus includes a table, a plate, an irradiation unit, an exposure position moving unit, and a relative position changing unit. A substrate to be exposed is placed on the table. The plate is provided with an opening for surrounding a peripheral edge of the substrate placed on the table. The irradiation unit forms an immersion region filled with an immersion liquid at an exposure position of the substrate placed on the table and irradiates the exposure position with exposure light via the immersion region. The exposure position moving unit moves the exposure position. The relative position changing unit changes a relative position between the table and the plate. |
