发明名称 Growth of Antimony Doped P-type Zinc Oxide Nanowires for Optoelectronics
摘要 In a method of growing p-type nanowires, a nanowire growth solution of zinc nitrate (Zn(NO3)2), hexamethylenetetramine (HMTA) and polyethylenemine (800 Mw PEI) is prepared. A dopant solution to the growth solution, the dopant solution including an equal molar ration of sodium hydroxide (NaOH), glycolic acid (C2H4O3) and antimony acetate (Sb(CH3COO)3) in water is prepared. The dopant solution and the growth solution combine to generate a resulting solution that includes antimony to zinc in a ratio of between 0.2% molar to 2.0% molar, the resulting solution having a top surface. An ammonia solution is added to the resulting solution. A ZnO seed layer is applied to a substrate and the substrate is placed into the top surface of the resulting solution with the ZnO seed layer facing downwardly for a predetermined time until Sb-doped ZnO nanowires having a length of at least 5 mum have grown from the ZnO seed layer.
申请公布号 US2014072756(A1) 申请公布日期 2014.03.13
申请号 US201314024798 申请日期 2013.09.12
申请人 GEORGIA TECH RESEARCH CORPORATION 发明人 WANG ZHONG LIN;PRADEL KEN
分类号 H01L41/18 主分类号 H01L41/18
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