发明名称 MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF MICROSTRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing apparatus and a manufacturing method for manufacturing a microstructure having a certain angle more reliably.SOLUTION: A manufacturing apparatus for a microstructure including an ion gun 4 for irradiating the surface of an irradiated object 8 with a focused ion beam 14, a gas supply section 9 for supplying material gas to a region being irradiated with the focused ion beam 14, and a scan deflector 6 for scanning the focused ion beam 14, is further provided with an irradiation amount control section 10 for controlling the irradiation amount of the focused ion beam 14. The irradiation amount control section 10 has a measurement section 11 for measuring the electrical characteristics caused by the focused ion beam 14, and controls the irradiation amount of the focused ion beam 14 so that the electrical characteristics fall within a predetermined range.
申请公布号 JP2014044829(A) 申请公布日期 2014.03.13
申请号 JP20120185574 申请日期 2012.08.24
申请人 UNIV OF TOKYO 发明人 KOMETANI REO;GUO DENGJI;ISHIHARA NAO;WARISAWA SHINICHI
分类号 H01J37/30;B01J19/08;B81C1/00;C01B31/02;H01J37/317 主分类号 H01J37/30
代理机构 代理人
主权项
地址