发明名称 |
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM |
摘要 |
A substrate processing apparatus includes a processing section and an exposure transport section. The exposure transport section includes a horizontal transport region and a plurality of vertical transport regions in a casing. The horizontal transport region is provided at the upper portion of the casing to extend in the X direction. A plurality of exposure devices are arranged below the horizontal transport region to be lined up in the X direction. A transport mechanism is provided in the horizontal transport region. The transport mechanism is configured to be capable of transporting a substrate between the processing section and the plurality of exposure devices. |
申请公布号 |
US2014071423(A1) |
申请公布日期 |
2014.03.13 |
申请号 |
US201314022657 |
申请日期 |
2013.09.10 |
申请人 |
TAGUCHI TAKASHI;KUWAHARA JOJI |
发明人 |
TAGUCHI TAKASHI;KUWAHARA JOJI |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|