Applying oxide layer made of base element to surface of substrate comprises plasma coating surface of substrate with preparation layer using process gas containing base element in gaseous compound, and plasma treating preparation layer

摘要

The method comprises plasma coating a surface (4) of a substrate (2) with a preparation layer (12) using a first process gas containing base element in a gaseous compound so that the preparation layer includes the base element, and plasma treating the preparation layer using a second process gas containing molecular oxygen. The first process gas contains a gaseous precursor, and a carrier gas. The element includes a metal or a semiconductor. The second process gas is air. The substrate is made of a metallic, semiconducting, ceramic or organic material, and includes micro- or nanoparticles.