| 摘要 |
PROBLEM TO BE SOLVED: To provide a control method of an exposure device which can control illumination distribution with high precision, a control program of the exposure device, and the exposure device.SOLUTION: In the control method of an exposure device 10, a deviation from a target value of an illumination distribution on a reticle 13 is calculated, on the basis of a measured value of the illumination distribution on a wafer 18 and a relational expression representing correlation among the illumination distribution of light on the reticle 13, the light being applied on the reticle 13, an image intensity distribution in which characteristics of a reflection optical system 16 are reflected as a projection optical system which allows the light passing through the reticle 13 to be projected on the wafer 18, and the illumination distribution of the light on the wafer 18, the light being applied through the reflection optical system 16 on the wafer 18. |
