| 摘要 |
PROBLEM TO BE SOLVED: To optimize illumination and irradiation conditions of an irregularity inspection device and method for detecting an irregularity defect of an object to be inspected having a periodic pattern such as a photomask for an imaging device and a photomask for a display device.SOLUTION: In an irregularity inspection method, a substrate having a periodic pattern formed in a substrate surface is a target to be inspected, irradiated with illumination light at a plurality of different irradiation angles, and inspected by using diffraction light generated by the periodic pattern. The intensity and diffraction direction of the diffraction light when a normal part is irradiated with light by the irregularity inspection method are obtained from the normal part of the pattern by calculation. Further, a pattern shape when fluctuations are applied is estimated and the intensity and diffraction direction of the diffraction light when the estimated pattern shape is irradiated with the light by the irregularity inspection method are obtained by the calculation. By comparing both, the optimum inspection conditions of the periodic pattern being the object to be inspected are calculated. |
