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发明名称
Verfahren zum Herstellen epitaktischer Halbleiterschichten auf Substratkörpern
摘要
申请公布号
CH469507(A)
申请公布日期
1969.03.15
申请号
CH19680004549
申请日期
1968.03.27
申请人
SIEMENS AKTIENGESELLSCHAFT
发明人
SIRTL,ERHARD,DR.;BOHLA,FRIEDRICH,DR.
分类号
C23G5/00;C30B25/02;(IPC1-7):B01J17/30
主分类号
C23G5/00
代理机构
代理人
主权项
地址
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