发明名称 UPPER SURFACE ANTIREFLECTIVE FILM FORMING COMPOSITION AND PATTERN FORMING METHOD USING SAME
摘要 [Object] To provide a top anti-reflection coating composition equal or superior to known products in film-formability, in refractive index, in temporal stability and in safety; and also to provide a pattern formation method employing that. [Means] A top anti-reflection coating composition comprising a solvent, an alkylsulfonic acid having 10 to 18 carbon atoms, and a fluorine-containing polymer having a weight average molecular weight of 300000 to 800000 and represented by the formula (1): -A x -B y - (1). In the formula (1), A is a repeating unit represented by the formula (A): (R is a fluorine-containing alkylene group having 1 to 40 carbon atoms or R is a fluorine-containing alkylene group having 2 to 100 carbon atoms and an ether bond); B is a repeating unit capable of combining with A to form a copolymer; x and y are numbers indicating the polymerization ratios, provided that x is not equal to 0; and A and B may randomly combine with each other or may form blocks.
申请公布号 KR20140031896(A) 申请公布日期 2014.03.13
申请号 KR20137029886 申请日期 2012.04.11
申请人 AZ ELECTRONIC MATERIALS IP (JAPAN) KK 发明人 SAO TAKAYUKI;KATAYAMA TOMOHIDE
分类号 G03F7/11;G03F7/26;H01L21/027 主分类号 G03F7/11
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