| 摘要 |
PROBLEM TO BE SOLVED: To easily lift a substrate from a stage after the substrate has been subjected to plasma processing.SOLUTION: A plasma processing apparatus 10 includes: a stage 36 mounting a substrate 28 fixed to a support 26 thereon; a blade 20 conveying the substrate 28; and movable mechanisms 24, 25 moving the blade 20. At least a part of the surface of the blade 20 is formed of a conductor. The conductor is grounded. The movable mechanisms 24, 25 move the blade 20 so that the conductor is brought into contact with a conductive film 29 formed at least on the substrate 28 on the stage 36. |
