| 摘要 |
A mask data generating method for generating data of a plurality of masks used in a plurality of exposures in which exposure light is irradiated onto a substrate using a mask, and then exposure light is irradiated onto the substrate using another mask. The method includes the steps of obtaining data for a pattern including a plurality of pattern elements, determining formulation of a disposition limitation condition for the pattern elements, analyzing the distance between the pattern elements, determining formulation of the distance limitation condition, and applying a first variable configured to express a number of pattern divisions and a second variable configured to express a distance related to all pattern elements in a cost function and thereby dividing the pattern. |
