| 摘要 |
A substrate Al detection means (33a) irradiates primary X-rays from a measurement head (23) onto a substrate (11) before film formation, detects, by means of the measurement head (23), X-ray fluorescence generated from the substrate (11), and detects the aluminum component contained in the substrate (11). When an Al film has been formed on the substrate (11), an Al film correction means (33b) corrects, on the basis of the detection results of the substrate Al detection means (33a), the intensity of the X-ray fluorescence detected from the Al layer by means of the measurement head (23) and calculates the thickness of the Al film. |
