发明名称 |
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD OF GENERATING RECIPE |
摘要 |
Provided is a method of automatically setting, in a recipe, a process parameter (PP) according to the number of substrates to be processed. The method includes (a) displaying a process parameter of a process recipe on a display unit; (b) displaying a parameter name in a process parameter file on the display unit; (c) generating a first recipe by substituting the process parameter with the parameter name; (d) downloading the first recipe and one of a plurality of condition tables corresponding to the selected number of substrates when the number of substrates to be processed in a processing chamber is selected; and (e) generating a second recipe by substituting the process parameter of the downloaded one of the condition tables for the parameter name in the downloaded first recipe. |
申请公布号 |
US2014074277(A1) |
申请公布日期 |
2014.03.13 |
申请号 |
US201314022860 |
申请日期 |
2013.09.10 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC. |
发明人 |
MITSUI HIROYUKI;NISHIURA SUSUMU;EKKO HIROSHI;INOSHIMA KAORI;NAKAYA KAZUO;MORITA OSAMU |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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