| 摘要 |
The problem to be solved by the present invention is to provide a production method for polishing-material particles, said production method with which the amount of cerium oxide used can be suppressed and greater durability and polishing speed can be achieved. This production method for polishing-material particles is characterized in that: an inner layer (1) is formed having, as a main component thereof, a salt of at least one element selected from Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and the alkali earth metals; a prepared aqueous solution is added, at a prescribed time, to a reaction solution in which the salt formed from the element is dispersed, to form an external layer (2) on the outside of the inner layer (1); solid-liquid separation is used to separate a polishing-material-particle precursor from the reaction solution, and the polishing-material-particle precursor is baked; and the percentage of Ce in the reaction solution in which the surface of the external layer (2) is formed is in the range of 60-90 mol% inclusive. |
