| 摘要 |
The present invention relates to a method for stabilizing plasma ignition in a continuous process conducted on a substrate. The method for stabilizing plasma ignition in a continuous process includes a step of applying a spike of RF power between an upper electrode and a lower electrode where the substrate is located, wherein the spike starts from zero power, jumps to spike power, and then drops to base power which is low enough to cause ignition failure of plasma; and a step of continuously applying the RF power at the base power between the upper and lower electrodes for a period longer than the period in which the spike processes the substrate. The spike reduces the ignition failure. |
