| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for determining doses of a pattern to be printed in electron beam lithography.SOLUTION: A method comprises the following steps: modeling 102 of a pattern by breaking down this pattern into a set of elementary geometric shapes (M[1,1], ..., M[N,N]) of the pattern; and, for each geometric shape of the model, determination 104, 106 of an electrical charge dose to be applied to an electron beam during individual printing of the elementary geometric shape, this dose being selected from a discrete set D of doses including several non-zero predetermined doses recorded in memory. The set of elementary geometric shapes (M[1,1], ..., M[N,N]) is a bidimensional paving of identical elementary geometric shapes covering the pattern C to be printed. In addition, when the doses to be applied to the elementary geometric shapes are determined 104, 106, a discretization error correction 106 is made by dithering. |
