发明名称 |
POSITIVE RESIST COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION |
摘要 |
A positive resist composition contains: (A) a polymer compound having a structure where a hydrogen atom of a phenolic hydroxyl group is replaced by an acid labile group represented by the following formula (I): wherein R represents a monovalent organic group; A represents a group having a polycyclic hydrocarbon ring structure or a group having a polycyclic heterocyclic structure; and * represents a bonding position to an oxygen atom of the phenolic hydroxyl group. |
申请公布号 |
US2014072905(A1) |
申请公布日期 |
2014.03.13 |
申请号 |
US201314073322 |
申请日期 |
2013.11.06 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
TSUCHIMURA TOMOTAKA;INASAKI TAKESHI |
分类号 |
G03F1/22;G03F1/20;G03F7/039 |
主分类号 |
G03F1/22 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|