Lighting system for microlithographic projection exposure system, has optical element directing light beam on another optical element such that main beam extends from non-zero angle to optical axis of illumination system

摘要

The system has a honeycomb condenser (36) arranged between a light source (31) and a pupil molding device (PFE), where the condenser comprises two honeycomb plates (W1, W2) and an array of optic elements. Each optic element is arranged in a pupil plane (56) to produce a light spot at a location by changing a deflection angle of a light deflecting element (42). The optical elements of one honeycomb plate direct a light beam on an optical element of another honeycomb plate such that main beam extends from a non-zero angle to an optical axis (OA) of an illumination system.