| 发明名称 |
METHOD OF COATING AND ETCHING |
| 摘要 |
<p>A method of chemical vapour deposition of a material on a substrate, or etch of material from a substrate. The method comprises forming a plasma using a short pulsed power signal so that the plasma is a short pulsed plasma for enhancing the deposition of material to the substrate or the etch of material from the substrate.</p> |
| 申请公布号 |
WO2014037736(A1) |
申请公布日期 |
2014.03.13 |
| 申请号 |
WO2013GB52339 |
申请日期 |
2013.09.06 |
| 申请人 |
THE UNIVERSITY OF SALFORD |
发明人 |
SHEEL, DAVID;HODGKINSON, JOHN |
| 分类号 |
C23C16/02;C23C16/40;C23C16/515;H01J37/32 |
主分类号 |
C23C16/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
