发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND BLACK MATRIX USING THE SAME
摘要 Disclosed are a photosensitive resin composition that includes (A) a cardo-based resin including repeating units represented by the following Chemical Formulae 1 and 2, wherein the substituents of Chemical Formulae 1 and 2 are the same as defined in the specification, (B) reactive unsaturated compound, (C) a pigment, (D) an initiator, and (E) a solvent, and a light blocking layer using the photosensitive resin composition.
申请公布号 KR101367253(B1) 申请公布日期 2014.03.13
申请号 KR20100099926 申请日期 2010.10.13
申请人 发明人
分类号 G02B5/20;G03F7/027 主分类号 G02B5/20
代理机构 代理人
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