发明名称
摘要 PROBLEM TO BE SOLVED: To produce high-purity silicon nitride fine powder by a direct nitriding method. SOLUTION: A method for producing high-purity silicon nitride fine powder comprises the steps of: crushing machining scraps of high-purity silicon having≥10 m<SP>2</SP>/g specific surface area to obtain a fine powder raw material having≤1.1μm D50 (50% cumulative diameter) and≤4μm D90 (90% cumulative diameter); if necessary, mixing high-purity silicon nitride powder in the fine powder raw material; and placing/heating the (high-purity silicon nitride powder-mixed) fine powder raw material in an atmosphere including nitrogen gas or ammonia gas to react the particles thereof with one another at 1,300-1,700 highest temperature. It is preferable that a wet jet mill is used at the step of crushing machining scraps and the total of Fe, Al and Ca contained in the fine powder raw material obtained by the crushing is≤40 ppm. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP5440977(B2) 申请公布日期 2014.03.12
申请号 JP20090204049 申请日期 2009.09.03
申请人 发明人
分类号 C01B21/068 主分类号 C01B21/068
代理机构 代理人
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