| 摘要 |
<p>The present invention relates to an exposure apparatus capable of uniformly exposing a substance with a large area to be exposed through a single exposure process. The uniform light exposure apparatus for a large area according to the present invention is able to uniformly irradiate ultraviolet on a display panel of a large area which is a substrate to be exposed through a single exposure process by using an ultraviolet guide part, is able to prevent the stain phenomenon of the display panel capable of being generated by the non-uniform exposure of ultraviolet, increases productivity by reducing exposure time and is able to reduce power consumption. Additionally, the exposure apparatus is able to perform an exposure process without a lens and a mirror, does not need an additional excessive cooling device and is able to reduce manufacture costs and installation costs by the simplification of a structure, reduction of a volume and the lightness of an equipment as compared to an existing exposure apparatus. [Reference numerals] (AA) Substrate to be exposed (display panel)</p> |
