PLASMA SOURCE WITH BELT TYPE MAGNET ASSEMBLIES

摘要

The present invention relates to a plasma source and an application thereof. The present invention obtains a thin film with high quality by generating uniform plasma with high density in a high vacuum state and applying the plasma source to a sputtering device, a neutral particle beam source, and a thin film deposition system formed by a combination of the sputtering device and the neutral particle beam source. According to the present invention, the purpose of the present invention is achieved by connecting a magnetic field due to one or more pairs of belt type magnets with microwaves from a microwave emitting device.