APPARATUS FOR PROCESSING SUBSTRATE

摘要

According to one embodiment of the present invention, an apparatus for processing a substrate includes a chamber body which has an open upper part and where a passage for entering the substrate is formed; a chamber lid which is installed in the upper part of the chamber body and provides a process space for processing the substrate by closing the open upper part of the chamber body; a susceptor which is installed in the process space and heats the substrate; and a heating block which is installed in the upper or the lower part of the passage and preheats the substrate loaded through the passage.