发明名称 Screen print system and method for cleaning a mask of the same
摘要 It is an objective to provide a screen print system and a method for cleaning a mask of the screen print system that enable sufficient cleaning of the mask used for subjecting a cavity substrate to screen printing. A screen print system includes a first cleaning unit 16a and a second cleaning unit 16b. The first cleaning unit 16a sequentially brings a mask contact area R, which is formed by stretching a paper member 42 over an upper end of a nozzle part 41, into contact with lower surfaces of respective convex portions 13t of a first mask 13a, thereby removing paste Pst adhering to the respective lower surfaces of the respective convex portions 13t. The second cleaning unit 16b brings the mask contact area R, which is formed by stretching the paper member 42 over the upper end of the nozzle part 41, into contact with a lower surface of a second mask 13b, thereby removing the paste Pst adhering to the lower surface of the second mask 13b. The first cleaning unit 16a winds up the paper member 42 while removing the paste Pst adhering to the lower surfaces of the convex portions 13t of the first mask 13a.
申请公布号 GB2488383(B) 申请公布日期 2014.03.12
申请号 GB20110014955 申请日期 2010.12.13
申请人 PANASONIC CORPORATION 发明人 TETSUYA TANAKA;KUNIHIKO TOKITA
分类号 B41F35/00;B41F15/08;B41F15/12;H05K3/12 主分类号 B41F35/00
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