发明名称 |
Method for improving flatness of a layer deposited on polycrystalline layer |
摘要 |
Described is a method for improving the flatness of a layer deposited on a doped polycrystalline layer, which includes reducing the grain size of the polycrystalline layer to decrease the out-diffusion amount of the dopant from the polycrystalline layer, and/or reducing the amount of the out-diffusing dopant on the surface of the polycrystalline layer. |
申请公布号 |
US8669184(B2) |
申请公布日期 |
2014.03.11 |
申请号 |
US201113012506 |
申请日期 |
2011.01.24 |
申请人 |
LUOH TUUNG;YANG LING-WU;YANG TA-HONE;CHEN KUANG-CHAO;MACRONIX INTERNATIONAL CO., LTD. |
发明人 |
LUOH TUUNG;YANG LING-WU;YANG TA-HONE;CHEN KUANG-CHAO |
分类号 |
H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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