发明名称 Simultaneous and selective partitioning of via structures using plating resist
摘要 Systems and methods for simultaneously partitioning a plurality of via structures into electrically isolated portions by using plating resist within a PCB stackup are disclosed. Such via structures are made by selectively depositing plating resist in one or more locations in a sub-composite structure. A plurality of sub-composite structures with plating resist deposited in varying locations are laminated to form a PCB stackup of a desired PCB design. Through-holes are drilled through the PCB stackup through conductive layers, dielectric layers and through the plating resist. Thus, the PCB panel has multiple through-holes that can then be plated simultaneously by placing the PCB panel into a seed bath, followed by immersion in an electroless copper bath. Such partitioned vias increase wiring density and limit stub formation in via structures. Such partitioned vias allow a plurality of electrical signals to traverse each electrically isolated portion without interference from each other.
申请公布号 US8667675(B2) 申请公布日期 2014.03.11
申请号 US20080190551 申请日期 2008.08.12
申请人 DUDNIKOV, JR. GEORGE;SANMINA SCI CORPORATION 发明人 DUDNIKOV, JR. GEORGE
分类号 H01K3/10 主分类号 H01K3/10
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