发明名称 |
Polyimide-based polymers, copolymers thereof and positive type photoresist compositions comprising the same |
摘要 |
Polyimide-based polymers and copolymers thereof are provided. Further provided is a positive type photoresist composition comprising at least one of the polyimide-based polymers and copolymers thereof as a binder resin. The photoresist composition exhibits high resolution, high sensitivity, excellent film characteristics and improved mechanical properties, which are required for the formation of semiconductor buffer coatings. |
申请公布号 |
US8669038(B2) |
申请公布日期 |
2014.03.11 |
申请号 |
US201213568911 |
申请日期 |
2012.08.07 |
申请人 |
PARK CHAN HYO;KIM SANG WOO;KIM KYUNG JUN;SEONG HYE RAN;SHIN SE JIN;OH DONG HYUN;LG CHEM, LTD. |
发明人 |
PARK CHAN HYO;KIM SANG WOO;KIM KYUNG JUN;SEONG HYE RAN;SHIN SE JIN;OH DONG HYUN |
分类号 |
G03F7/023 |
主分类号 |
G03F7/023 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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