| 摘要 |
<p>Provided is an optical proximity correction modeling method and a system for the same. The purpose of the optical proximity correction modeling method is to estimate a topography effect using a pattern stack structure including a first matter pattern, a second matter pattern, and a boundary area of the first and second matter patterns. The present invention includes a step of generating a first area filter corresponding to the first matter pattern, a second area filter corresponding to the second matter pattern, and an edge function corresponding to the boundary area; a step of generating a bulk image signal from a layout using the first area filter and the second area filter; a step of generating the edge image signal from the layout using the edge function, the first area filter, the second area filter, and a property kernel to which the properties of the boundary area are applied; and a step of generating a final model signal using the bulk image signal and the edge image signal. [Reference numerals] (AA) Start; (BB) End; (S310) Generating an area filter and an edge function; (S320) Generating a bulk image signal; (S330) Generating an edge image signal; (S340) Generating a final model signal</p> |
