发明名称 |
Method of forming a nanostructure |
摘要 |
A method of forming a discrete nanostructured element at one or more predetermined locations on a substrate is presented. The method includes forming a mask member over the substrate. A window is formed in the mask member at each of one or more locations at which it is required to form the nanostructured element thereby to expose a portion of a surface of the substrate. A portion of the substrate exposed by the window at the one or more locations is removed to form one or more recesses in the substrate. The method further includes forming a layer of a nanostructure medium over a surface of the recess and annealing the structure thereby to form the nanostructured element in each of the one or more recesses. The nanostructured element includes a portion of the nanostructure medium and has an external dimension along at least two substantially orthogonal directions of less than substantially 100 nm. |
申请公布号 |
US8668833(B2) |
申请公布日期 |
2014.03.11 |
申请号 |
US20080125030 |
申请日期 |
2008.05.21 |
申请人 |
CHEW HAN GUAN;ZHENG FEI;CHOI WEE KIONG;LIEW TZE HAW;GLOBALFOUNDRIES SINGAPORE PTE. LTD.;NATIONAL UNIVERSITY OF SINGAPORE |
发明人 |
CHEW HAN GUAN;ZHENG FEI;CHOI WEE KIONG;LIEW TZE HAW |
分类号 |
B32B33/00;B44C1/22;H01L21/311 |
主分类号 |
B32B33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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