发明名称 Apparatus for forming a nano-pattern and method using the same
摘要 An apparatus and a method for forming a fine pattern are provided to secure the stability of the fine pattern formed on a substrate by applying uniform pressurization force for pressurizing a stamp. Chambers(100,200) provide process spaces. A stamp chuck(110) is formed at a side of the process space. A stamp(20) on which a fine pattern is carved is attached to the stamp chuck. A stage(210) is formed on a position on which the stamp falls is formed at the other side of the process space. The stage supports a substrate(10) on which a photoresist layer(12) is formed. When the stamp is dropped from the stamp chuck and then contacted to the substrate, a pump pressurizes the stamp to implant pressurization gas into the chamber. The pressurization gas imprints the fine pattern to the photoresist layer. A substrate chuck(220) is formed on the stage to attach the substrate. The stamp chuck and the substrate chuck are electrostatic chucks for attaching the stamp to the substrate by using electrostatic force.
申请公布号 KR101371093(B1) 申请公布日期 2014.03.10
申请号 KR20060108173 申请日期 2006.11.03
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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