DEVICE AND METHOD OF MEASURING SUBSTRATE TEMPERATURE AND HEAT TREATMENT CHAMBER AND APPARATUS OF SUBSTRATE HAVING THE SAME

摘要

The present invention relates to a device and a method for measuring a substrate temperature and a chamber and an apparatus including the same for heat treating a substrate.The device for measuring a substrate temperature according to the present invention includes a tube; and at least one thermocouple provided in the tube. The device for measuring a substrate temperature is provided close to a lateral side of a substrate in the heat treatment chamber of the substrate. Further, a method for measuring a substrate temperature includes a) providing a device for measuring a substrate temperature including upper and lower housings, and provided in a plurality of chambers to provide a heat treatment space of the substrate; and b) directly measuring a heat treatment temperature of the substrate using the device for measuring a substrate temperature.