| 摘要 |
A focusing position adjusting method, a focusing position adjusting device, and a laser processing device.The invention provides a method for properly adjusting focusing state of a substrate which is provided with concave-convex structures on a surface and disposed on a boundary channel of a recess. For cruciate shading patterns with a first shading pattern having a plurality of unit shading areas evenly spaced arranged and a second shading pattern orthometric with the first shading pattern, projection is performed as the following method with a crosswise area centered by a grid point of the boundary channel as a projection range. The shading patterns are configured to be inclined relative to an optical axis, imaging positions of the plurality of unit shading areas of the first shading pattern are different in height respectively, and the second shading pattern forms imaging at a height position. Based on an image taken when the grid points and a center of the image is fitted so that an area in the projection range is taken, and a position where contrast ratio of the specified first shading patterns is maximal, and based on a distance of the position with the maximum contrast ratio and a position of the grid point, focusing positions of a focusing mechanism is adjusted, so that a focusing object area is in a focused state. |
